Lee, Y.-H. and Kwon, D. (2002) Residual Stress in DLC/Si and Au/Si Systems: Application of a Stress-Relaxation Model to the Nanoindentation Technique. Journal of Materials Research, 17, 901-906.

相关文章:
在线客服:
对外合作:
联系方式:400-6379-560
投诉建议:feedback@hanspub.org
客服号

人工客服,优惠资讯,稿件咨询
公众号

科技前沿与学术知识分享